On May 2nd, according to Russian media reports, in order to advance the progress of self-developed lithography machines, it has finalized relevant partners.

It is reported that the Russian side will provide approximately 10 billion rubles of credit support for two major Belarusian microelectronics projects, including Integral in the field of integrated circuit complete process and Planar in the field of precision lithography equipment.
Belarus also revealed that it has signed an agreement to establish a joint center for the development and production of photomask between the two countries This will enable us to carry out joint development work and reduce the dependence of Belarusian and Russian consumers on imported supplies.
According to data, Planar Company (KBTEM-OMO) is the largest semiconductor equipment supplier in Eastern Europe, with over 50 years of research and manufacturing history in semiconductor equipment. Its products include laser direct writing pattern generators, mask detection equipment, mask repair equipment, proximity/contact lithography machines, projection lithography machines, and silicon wafer detection equipment.
Prior to this, the Russian Academy of Sciences announced that a self-developed lithography machine in 2028 would be available, capable of producing 7nm chips. According to reports, after international sanctions cut off supply to Russia, it caused a shortage of Russian chips. In addition, the United States, the United Kingdom, and the European Union have also imposed multiple sanctions, and almost all advanced wafer manufacturers have stopped cooperating with Russian entities. ARM is also unable to license their technology to Russian chip designers.
The Novgorod Strategic Development Agency in Russia has made a bold statement, claiming that the Institute of Applied Physics under the Russian Academy of Sciences will break everyone's glasses and develop a lithography machine capable of producing 7-nanometer chips by 2028, which can also defeat similar ASML products.
The Deputy Director of the Nanostructure Research Institute of the Russian Academy of Sciences stated that the global leader in lithography, ASML, has been committed to EUV lithography machines for nearly 20 years, with the goal of maintaining extremely high production efficiency among the world's top semiconductor manufacturers.
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