Recently, an online message sparked heated discussions, stating that the Tsinghua University EUV project has made ASML lithography machines huge and achieved localization of lithography machines. It also stated that this project has been implemented in Xiong'an New Area, and the message is accompanied by such a picture.

In response, China Electronics Engineering Design Institute Co., Ltd. (referred to as "China Electronics Institute") issued a document regarding the recent news that "Tsinghua University EUV project has made ASML lithography machines huge, achieved localization of lithography machines, and has been implemented in Xiong'an New Area", pointing out that the project is not a domestic lithography machine factory, but rather the Beijing High Energy Synchronous Radiation Light Source Project (HEPS).

Actual photo of Beijing High Energy Synchronous Radiation Light Source Project (source: Chinese Academy of Electronics)

According to a report from the Chinese Academy of Electronics, HEPS is located on the bank of Yanqi Lake in Huairou, Beijing. It is a major scientific and technological infrastructure of the 13th Five Year Plan. It is the first high-energy synchrotron radiation light source in China and one of the fourth generation synchrotron radiation light sources with the highest brightness in the world. Construction began as early as 2019 and will be put into use by the end of 2025.

The function of HEPS is to accelerate the electron beam to 6GeV through an accelerator, then inject it into a storage ring with a circumference of 1360 meters, and maintain operation at a speed close to the speed of light. When the electron beam passes through bent magnets or various inserts at different positions of the storage ring, it will release stable, high-energy, and high brightness light along the tangent direction of the deflection orbit, which is synchronous radiation light. In short, HEPS can be seen as a super precision, ultra high speed, and powerful penetrating giant X-ray machine. Its small beams of light can penetrate matter and penetrate the interior for three-dimensional scanning, observing the microscopic world from multiple dimensions at the molecular and atomic scales. HEPS is a large scientific device for conducting scientific experiments, not a networked lithography machine factory.

It is reported that the project is led by Lou Yu, a national survey and design master and chief scientist of China National Investment Group. Multiple technical research and design teams from the Chinese Academy of Electronics collaborate to overcome technical difficulties such as uneven settlement, micro vibration control, ultra long structure design, photovoltaic panel design, precision temperature control, process circulation cooling water system, and ultra complex process system. At present, the supporting project of high-energy synchronous radiation light source has been fully completed.

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